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Wafer lens changes X-ray beam size by more than 3,400 times

Wafer lens changes X-ray beam size by more than 3,400 times
Schematic of the ultrathin monolithic bimorph mirror. (a) A photograph of the mirror substrate comparison with a Japanese 100-yen coin. (b) Deformation mechanism. (c) Variable-beam-size optical system. Credit: Scientific Reports (2025). DOI: 10.1038/s41598-025-05019-8

Using only a single-crystal piezoelectric thin wafer of lithium niobate (LN) instead of the usual two-part structure, a group from Nagoya University in Japan has created a deformable mirror that changes X-ray beam size by more than 3,400 times. This improved tuning range enhances both imaging and analysis, especially for the X-rays used in industry.

Their technique is based on LN, a material that has piezoelectricity, meaning that it changes its surface shape in response to voltage. Traditional X-ray mirrors are rigid and resistant to being deformed, making it difficult to adapt them to changing experimental conditions in real time, but the new technique can significantly change size, making it useful for a range of situations encountered in industry.

The study is in the journal Scientific Reports.

"Our technique significantly changes beam size, making it possible to observe samples in various ways," Takato Inoue from the Graduate School of Engineering Department of Materials 糖心视频ics explained. "We achieved a 3,400-times larger tuning range, which lets users first perform a wide-field overview of a sample and then zoom in on specific regions of interest, massively streamlining workflows."

By changing the shape of the mirror, the operator can fine-tune the X-ray to capture an overview of the material or focus on specific areas of interest. However, this is difficult in practice because the mirror often requires two parts to control the size of the beam, limiting its thinness. Instead, making a mirror with a would allow researchers to maintain thinness and optimize performance.

  • Wafer lens changes X-ray beam size by more than 3,400 times
    Experimental setup at the synchrotron radiation facility (SPring-8). Credit: Takato Inoue
  • Wafer lens changes X-ray beam size by more than 3,400 times
    Arrangement around the mirror. Credit: Takato Inoue

To make the single-crystal mirror, the researchers focused on LN. When LN is exposed to high levels of heat in a furnace, its polarization structure鈥攁 property that dictates how much it deforms鈥攃hanges. Using this property, they formed the bimorph structure used in mirrors without the need for , massively reducing the thickness of the mirror.

"We developed a mirror with a thickness of only 0.5 mm. This achievement is expected to greatly increase the degree of freedom for all experiments using synchrotron radiation X-rays," Inoue said. "These properties allow it to be used for X-rays as well as in other fields such as high-power lasers used in industry."

More information: Takato Inoue et al, Ultrathin monolithic bimorph mirror using polarization-inverted lithium niobate wafer, Scientific Reports (2025).

Journal information: Scientific Reports

Provided by Nagoya University

Citation: Wafer lens changes X-ray beam size by more than 3,400 times (2025, June 27) retrieved 27 June 2025 from /news/2025-06-wafer-lens-ray-size.html
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